The Challenges of Future Nodes: Insights Across the Supply Chain
There is no shortage of technical challenges at future nodes, and experts from across the lithography supply chain discussed their views and possible solutions at the LithoVision symposium earlier this year. The latter part of the symposium included industry specialists Kevin Lucas (Synopsys), Mark Smith (KLA-Tencor), Ralph Dammel (EMD Performance Materials), and Steve Renwick (Nikon Research).
In The News Around SPIE Advanced Lithography: Complexity and Cost
The SPIE Advanced Lithography conference featured many presentations focusing on the complexity and cost of advancing lithography. In case you weren’t able to attend this year’s conference, excerpts from various media channels are reported here.
Intel and Nikon Executives Highlight Industry Drivers and Litho Roadmap
Janice Golda of Intel Corporation discussed the key semiconductor industry drivers, and Ryoichi Kawaguchi detailed lithography industry requirements and the Nikon Roadmap at LithoVision.
Memory Scaling Challenges Detailed by Micron R&D Director
Micron Technology Director Erik Byers shared his insight on Memory scaling trends, emerging technologies, 3D integration, and associated lithography challenges at the LithoVision symposium.
GLOBALFOUNDRIES Lithography Expert Delivers Keynote at LithoVision
Dr. Harry Levinson of GLOBALFOUNDRIES provided an in-depth view of the Status of Lithography including challenges and viability for immersion extension, DSA, and EUV at the 7 nm node.
Optimizing Scanner Performance Under Extreme Process Conditions
Nikon experts spotlight comprehensive solutions that ensure optimal overlay and focus performance under the complex process conditions typical of high volume manufacturing at 10 nm and beyond.
Spotlight on Nikon Corporate Social Responsibility Programs
Nikon supports a number of charitable and non-profit organizations with employee involvement and financial contributions. While many national organizations receive ongoing annual contributions, Nikon employees are also encouraged to recommend support for local and regional charitable endeavors.
Industry Experts Focus on 193i Extension to 7 nm and Beyond at 12th Annual LithoVision Event
Nearly 550 attendees joined Nikon for the 12th annual LithoVision technical symposium focused on “193i Extension to 7 nm and Beyond…” Representatives of more than 120 international companies throughout the industry attended this year’s event to learn about the leading semiconductor lithography drivers, challenges, and solutions.
SUNY Polytechnic and Nikon to Install World’s First 450mm Immersion Lithography Tool to Accelerate Production of Next Generation Computer Chips
Upcoming Events
EIPBN 2015 San Diego, CA May 26-May 29, 2015 SEMICON West 2015 Booth 1705 San Francisco, California July 14-16, 2015