Past Edition – Spring 2017

At the annual Nikon conference, Dr. Ben Rathsack, Senior Director at Tokyo Electron America, stressed that edge placement error is the fundamental scaling challenge. Rathsack’s insightful presentation detailed a paradigm shift in patterning to self-alignment and bottom-up approaches.

Dr. Zhibiao Mao, Patterning Department Manager at Huali Microelectronics Corporation (HLMC), shared an illuminating perspective of the Chinese IC industry at the Nikon symposium. His presentation emphasized market growth opportunities, and detailed a successful program with Nikon and Mentor Graphics.

At LithoVision, Dr. John Sturtevant, Director of RET Product Development at Mentor Graphics, highlighted the importance of predicting and controlling total edge placement error. His engaging presentation examined critical mask and modeling challenges, and warned of additional EUVL complexities.

Nikon focuses on supporting next-generation engineering programs and the advancement of women in technology by sponsoring several initiatives that prioritize efforts promoting high tech careers.

Nikon has been using light to improve our world for 100 years, and to celebrate this milestone anniversary, it has launched a dedicated website alongside a video that traces the impressive history of Nikon.

Record-breaking attendance and phenomenal world-class speakers were just a couple of the highlights at this year’s LithoVision technical symposium, which focused on “A New Era of Manufacturing Integration.”

Dr. Donis Flagello, President, CEO, and COO of Nikon Research Corporation of America (NRCA), was presented with the 2017 Frits Zernike Award for Microlithography during SPIE Advanced Lithography in San Jose, California.

Yuichi Shibazaki, Nikon Fellow and Litho Business Development Sector Manager, previewed the next-generation immersion scanner and the inline Alignment Station (iAS) at LithoVision 2017.

Nikon leverages 100 years of opto-electronic and precision technology experience to deliver cost-effective lithography solutions that satisfy the requirements of a multitude of specialized markets.

Dr. Mark Phillips, Intel Fellow and Director of Lithography Hardware and Solutions, shared his expert view of on-product performance improvements and integrated software solutions at LithoVision. A complementary Nikon presentation at SPIE detailed the new inline Alignment Station (iAS).

EIPBN 2017 Orlando, FL May 30-June 2, 2017 SEMICON West 2017 Booth 5744, North Hall San Francisco, CA July 11-13, 2017