Nikon continues to provide support for the enrichment and advancement of women engineers, and inspire the next generation of students by sponsoring several initiatives that promote careers in STEM.
The 15th annual LithoVision symposium, which focused on “Solutions for an Application-driven World,” featured an excellent lineup of speakers and was lauded for having one of the best agendas ever among our technical programs.
Stochastic effects are an area of increasing focus and concern for EUV lithographers. John Biafore, Research Scientist at KLA-Tencor, provided an in-depth view of the many causes of these problematic effects as well as potential mitigation strategies at the Nikon symposium.
EIPBN 2017 Orlando, FL May 30-June 2, 2017 SEMICON West 2017 Booth 5744, North Hall San Francisco, CA July 11-13, 2017
Dr. Mark Phillips, Intel Fellow and Director of Lithography Hardware and Solutions, shared his expert view of on-product performance improvements and integrated software solutions at LithoVision. A complementary Nikon presentation at SPIE detailed the new inline Alignment Station (iAS).
At the annual Nikon conference, Dr. Ben Rathsack, Senior Director at Tokyo Electron America, stressed that edge placement error is the fundamental scaling challenge. Rathsack’s insightful presentation detailed a paradigm shift in patterning to self-alignment and bottom-up approaches.
Dr. Zhibiao Mao, Patterning Department Manager at Huali Microelectronics Corporation (HLMC), shared an illuminating perspective of the Chinese IC industry at the Nikon symposium. His presentation emphasized market growth opportunities, and detailed a successful program with Nikon and Mentor Graphics.
At LithoVision, Dr. John Sturtevant, Director of RET Product Development at Mentor Graphics, highlighted the importance of predicting and controlling total edge placement error. His engaging presentation examined critical mask and modeling challenges, and warned of additional EUVL complexities.
Nikon leverages 100 years of opto-electronic and precision technology experience to deliver cost-effective lithography solutions that satisfy the requirements of a multitude of specialized markets.
Yuichi Shibazaki, Nikon Fellow and Litho Business Development Sector Manager, previewed the next-generation immersion scanner and the inline Alignment Station (iAS) at LithoVision 2017.