Dear Reader,
As you know, IC manufacturing technology continues to evolve and advance rapidly to meet next-generation requirements. The past year has been marked with tremendous enhancements to 193 nm scanners and new computational lithography solutions to extend ArF immersion capabilities. This is made even more exciting with 450 mm wafer capability coming firmly onto the roadmap and rapid progress in the very promising new game-changing technology of directed self-assembly.
Many opportunities for innovation, as well as paradigm shifts in lithography technology and strategies were featured prominently at the 10th annual LithoVision technical symposium. More than 500 international representatives from across our industry attended the milestone event where industry experts from Nikon, GLOBALFOUNDRIES, Intel, AZ Electronic Materials, Dai Nippon Printing, Synopsys, and Fraunhofer IISB delivered insightful presentations discussing key lithography issues and solutions. The agenda showcased presentations on the Industry Roadmap and Future Device Trends, Enabling Production Beyond 20 nm, Mask and Materials Challenges for Next Generation Lithography, and more. An interactive panel discussion focused on key lithography events and innovations of the past 10 years, and discussed potential “game changers” for the future. In addition, the evening poster session featured informative contributions from a dozen partner companies. Highlights of several key LithoVision presentations are featured in this edition of the Nikon eReview, and full event materials are available to customers upon request.
In other news, Nikon has recently launched the NSR-S622D immersion scanner. The S622D is the latest evolution of the well-known Streamlign platform, and delivers unprecedented overlay performance and ultra-high productivity to satisfy the most aggressive sub-20 nm multiple patterning requirements.
Nikon values your input on how we can continue to improve our products, programs, and services, and we invite you to respond to the Nikon eReview (npicom@nikon.com) with your comments or suggestions.