LithoVision 2012 Breaks Attendance Records

Although 2011 was marked with a number of unpredictable challenges for our industry, the semiconductor manufacturing community adapted efficiently and recovery is well underway. This was evidenced at the annual LithoVision symposium where Nikon was pleased to host a record number of customers and industry partners seeking insight into future lithography trends, challenges, and innovations.

• Click image to enlarge.

  Click image to enlarge.

Figure 1. Nikon was pleased to host a record number of our customers and industry partners at the 2012 LithoVision technical symposium held prior to SPIE Advanced Lithography.

LithoVision 2012 was held at the historic San Jose Civic Auditorium prior to the start of SPIE Advanced Lithography, and clearly the 9^th annual event didn’t disappoint as more than 96% of LithoVision survey respondents reported that the technical content either "Met" or "Exceeded" their expectations.

In addition—a number of attendees commented on the comprehensive nature of the agenda and the caliber of the LithoVision speakers. As always, the many valuable ideas and input gleaned from the LithoVision surveys and attendee feedback will be used to develop next year’s program.

What attendees said about LithoVision 2012:

	“Nikon’s marketing strategies and roadmap are clearly shown. Good information from customer invited speeches.” – TSMC attendee
	“Interesting to see Nikon’s offerings and how the other technologies will allow patterning below 37 nm.” – Micron Technologies attendee
	“Good overview and perspective.” -  STMicroelectronics attendee
	“It has been a tradition of attending LithoVision on Sunday prior to SPIE…” - TSMC attendee
	“Thanks again for continuing LithoVision.” - Intel Corporation attendee
	“Usually attend every year.”  - SanDisk Corporation attendee
	“The litho direction is consolidated in a single meeting.” - Tokyo Electron attendee
	“Good agenda and content.”  - Seagate attendee