At the annual Nikon conference, Dr. Ben Rathsack, Senior Director at Tokyo Electron America, stressed that edge placement error is the fundamental scaling challenge. Rathsack’s insightful presentation detailed a paradigm shift in patterning to self-alignment and bottom-up approaches.
Dr. Zhibiao Mao, Patterning Department Manager at Huali Microelectronics Corporation (HLMC), shared an illuminating perspective of the Chinese IC industry at the Nikon symposium. His presentation emphasized market growth opportunities, and detailed a successful program with Nikon and Mentor Graphics.
At LithoVision, Dr. John Sturtevant, Director of RET Product Development at Mentor Graphics, highlighted the importance of predicting and controlling total edge placement error. His engaging presentation examined critical mask and modeling challenges, and warned of additional EUVL complexities.
Nikon leverages 100 years of opto-electronic and precision technology experience to deliver cost-effective lithography solutions that satisfy the requirements of a multitude of specialized markets.