Dr. Harry Levinson of GLOBALFOUNDRIES provided an in-depth view of the Status of Lithography including challenges and viability for immersion extension, DSA, and EUV at the 7 nm node.
Micron Technology Director Erik Byers shared his insight on Memory scaling trends, emerging technologies, 3D integration, and associated lithography challenges at the LithoVision symposium.
Janice Golda of Intel Corporation discussed the key semiconductor industry drivers, and Ryoichi Kawaguchi detailed lithography industry requirements and the Nikon Roadmap at LithoVision.
The SPIE Advanced Lithography conference featured many presentations focusing on the complexity and cost of advancing lithography. In case you weren’t able to attend this year’s conference, excerpts from various media channels are reported here.