EIPBN 2017 Orlando, FL May 30-June 2, 2017 SEMICON West 2017 Booth 5744, North Hall San Francisco, CA July 11-13, 2017
EIPBN 2015 San Diego, CA May 26-May 29, 2015 SEMICON West 2015 Booth 1705 San Francisco, California July 14-16, 2015
Nearly 550 attendees joined Nikon for the 12th annual LithoVision technical symposium focused on “193i Extension to 7 nm and Beyond…” Representatives of more than 120 international companies throughout the industry attended this year’s event to learn about the leading semiconductor lithography drivers, challenges, and solutions.
Nikon supports a number of charitable and non-profit organizations with employee involvement and financial contributions. While many national organizations receive ongoing annual contributions, Nikon employees are also encouraged to recommend support for local and regional charitable endeavors.
Nikon experts spotlight comprehensive solutions that ensure optimal overlay and focus performance under the complex process conditions typical of high volume manufacturing at 10 nm and beyond.
Dr. Harry Levinson of GLOBALFOUNDRIES provided an in-depth view of the Status of Lithography including challenges and viability for immersion extension, DSA, and EUV at the 7 nm node.
Micron Technology Director Erik Byers shared his insight on Memory scaling trends, emerging technologies, 3D integration, and associated lithography challenges at the LithoVision symposium.
Janice Golda of Intel Corporation discussed the key semiconductor industry drivers, and Ryoichi Kawaguchi detailed lithography industry requirements and the Nikon Roadmap at LithoVision.