Dr. Donis Flagello, President, CEO, and COO of Nikon Research Corporation of America (NRCA), was presented with the 2017 Frits Zernike Award for Microlithography on Monday, February 27, 2017 during SPIE Advanced Lithography in San Jose, California. The prestigious award, presented annually for outstanding accomplishments in microlithography technology, recognizes Flagello’s driving role in the understanding and improvement of image formation in optical lithography for semiconductor manufacturing.
For over thirty years, Flagello has been a prominent member of the microlithography community and has primarily focused on the rigorous application of physics to lithography modeling and problem solving. His influential work improved understanding of the lithographic process through development of methods that took into account previously unaccounted-for physical effects, thereby enabling the printing of smaller geometries. Flagello assumed his current role at NRCA two years ago, after serving as an NRCA Fellow for five years prior. He has authored over 50 papers, and holds two dozen patents. Dr. Flagello has a Ph.D. from the University of Arizona in Optical Science, and is also a member of OSA and a Fellow of SPIE.
Nikon Research Corporation of America provides research and development in the United States for the worldwide Nikon product portfolio. Currently, Dr. Flagello’s focus at NRCA is on helping Nikon transform their business and technology into new advanced technologies. He has put together teams to investigate many aspects of biomedical optical devices and artificial intelligence. He is a firm believer that NRCA’s vast expertise in machine learning, precision engineering, optics and computational imaging is an advantage that can be used to develop new innovations necessary to advance Nikon business.