Dr. Mark Phillips, Intel Fellow and Director of Lithography Hardware and Solutions, shared his expert view of on-product performance improvements and integrated software solutions at LithoVision. A complementary Nikon presentation at SPIE detailed the new inline Alignment Station (iAS).
Archives for April 2017
At the annual Nikon conference, Dr. Ben Rathsack, Senior Director at Tokyo Electron America, stressed that edge placement error is the fundamental scaling challenge. Rathsack’s insightful presentation detailed a paradigm shift in patterning to self-alignment and bottom-up approaches.
Dr. Zhibiao Mao, Patterning Department Manager at Huali Microelectronics Corporation (HLMC), shared an illuminating perspective of the Chinese IC industry at the Nikon symposium. His presentation emphasized market growth opportunities, and detailed a successful program with Nikon and Mentor Graphics.
At LithoVision, Dr. John Sturtevant, Director of RET Product Development at Mentor Graphics, highlighted the importance of predicting and controlling total edge placement error. His engaging presentation examined critical mask and modeling challenges, and warned of additional EUVL complexities.
Yuichi Shibazaki, Nikon Fellow and Litho Business Development Sector Manager, previewed the next-generation immersion scanner and the inline Alignment Station (iAS) at LithoVision 2017.
Nikon has been using light to improve our world for 100 years, and to celebrate this milestone anniversary, it has launched a dedicated website alongside a video that traces the impressive history of Nikon.
Nikon focuses on supporting next-generation engineering programs and the advancement of women in technology by sponsoring several initiatives that prioritize efforts promoting high tech careers.
Dr. Donis Flagello, President, CEO, and COO of Nikon Research Corporation of America (NRCA), was presented with the 2017 Frits Zernike Award for Microlithography during SPIE Advanced Lithography in San Jose, California.
Record-breaking attendance and phenomenal world-class speakers were just a couple of the highlights at this year’s LithoVision technical symposium, which focused on “A New Era of Manufacturing Integration.”