The Nikon eReview

The Nikon eReviewSpring 2018

  • Home
  • Featured
  • Innovations & Enhancements
  • News
  • Nikon Happenings
  • Past Editions

Nikon Hosts Over 550 Guests at 2014 LithoVision Technical Symposium

A record-setting audience joined Nikon for the 11th annual LithoVision technical symposium, which focused on “Patterning to 7 nm and Beyond.” Representatives of more than 120 international companies throughout the semiconductor industry attended this year’s event to learn about the topmost lithography trends, challenges, and solutions.

2014-happening3-1a2014-happening3-1b
Figure 1A. A new venue, the Center for Performing Arts, hosted more than 550 global representatives of the semiconductor industry at the 2014 Nikon LithoVision technical symposium (left image). Figure 1B. An interactive panel session focused on the challenges of “Patterning to 7 nm and Beyond…”

The 2014 event featured an in-depth review of the State of Lithography from Dr. Christopher Progler, CTO of Photronics, and showcased a number of insightful presentations by industry experts discussing the tremendous capabilities for immersion extension to 10 nm and beyond. Presenters addressed critical lithography challenges and solutions, and revealed exceptional progress in scanner performance. The interactive panel discussion, moderated by Dr. Donis Flagello of Nikon Research Corporation of America, provided an opportunity for attendees to glean additional insight on the experts’ views of “Patterning to 7 nm and Beyond.” The evening was capped by a poster session that included more than a dozen external presenters, and an enjoyable reception in the lobby of the Center for Performing Arts – a beautiful Art Deco theater built in 1972 by the Frank Lloyd Wright Foundation.

LithoVision is consistently lauded for the great technical content and speaker lineup, with guests commenting that LithoVision is “A great start to SPIE week…” and the 2014 event was “The best LithoVision to date…” Highlights of a number of the LithoVision presentations are featured in this edition of the Nikon eReview, and full event materials are available to customers upon request.

Spring 2018 Edition

Featured
  • KLA-Tencor Research Scientist Emphasizes Stochastic Challenges at LithoVision 2018
Innovations & Enhancements
  • Nikon Experts Introduce NSR-S635E and iAS/LithoBooster Innovations at LithoVision and SPIE
News
  • IC Knowledge President Shares View of Semiconductor Landscape at Nikon Symposium
  • Intel Principal Engineer Highlights Overlay and Underlay Control Challenges in 193i Scaling
  • Seagate Technology Expert Details HAMR Process and Hard Disk Drive Litho Requirements
  • Applied Materials Executive Stresses Criticality of Materials-Enabled Solutions for EPE
  • The Latest Lithography Solutions for Advanced MEMS, LED, and Packaging Applications
Nikon Happenings
  • Nikon Precision Exhibiting at SEMICON West – July 10-12, 2018
  • Director of Nikon Research Corporation to Present at 25th Lithography Workshop – June 17-21, 2018
  • Nikon Corporation Recognized by Intel as a 2017 Achievement Award Winner for Technology
  • Nikon Implementing New Initiatives to Expand Customer Support Capabilities
  • Nikon is Committed to Women in Engineering and Next-Generation Engineering Initiatives
  • LithoVision Achieves 15 Year Milestone Event

© Copyright 2019 Nikon Precision Inc. · All Rights Reserved ·
Visit www.nikonprecision.com | Privacy Policy