A record-setting audience joined Nikon for the 11th annual LithoVision technical symposium, which focused on “Patterning to 7 nm and Beyond.” Representatives of more than 120 international companies throughout the semiconductor industry attended this year’s event to learn about the topmost lithography trends, challenges, and solutions.
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| Figure 1A. A new venue, the Center for Performing Arts, hosted more than 550 global representatives of the semiconductor industry at the 2014 Nikon LithoVision technical symposium (left image). Figure 1B. An interactive panel session focused on the challenges of “Patterning to 7 nm and Beyond…” | |
The 2014 event featured an in-depth review of the State of Lithography from Dr. Christopher Progler, CTO of Photronics, and showcased a number of insightful presentations by industry experts discussing the tremendous capabilities for immersion extension to 10 nm and beyond. Presenters addressed critical lithography challenges and solutions, and revealed exceptional progress in scanner performance. The interactive panel discussion, moderated by Dr. Donis Flagello of Nikon Research Corporation of America, provided an opportunity for attendees to glean additional insight on the experts’ views of “Patterning to 7 nm and Beyond.” The evening was capped by a poster session that included more than a dozen external presenters, and an enjoyable reception in the lobby of the Center for Performing Arts – a beautiful Art Deco theater built in 1972 by the Frank Lloyd Wright Foundation.
LithoVision is consistently lauded for the great technical content and speaker lineup, with guests commenting that LithoVision is “A great start to SPIE week…” and the 2014 event was “The best LithoVision to date…” Highlights of a number of the LithoVision presentations are featured in this edition of the Nikon eReview, and full event materials are available to customers upon request.