The Nikon eReview

The Nikon eReviewSpring 2018

  • Home
  • Featured
  • Innovations & Enhancements
  • News
  • Nikon Happenings
  • Past Editions

Dear Reader,

2017 was a tremendous year for the semiconductor industry and a special one for Nikon, as we celebrated our 100th anniversary. Since its establishment, Nikon has delivered innovative solutions based on optical and precision technologies to benefit society. In this past year we’ve been determined to “Unlock the future with the power of light,” in the semiconductor industry.

Nikon Precision kicked off this year by hosting our 15th annual LithoVision symposium, where experts from GLOBALFOUNDRIES, IC Knowledge LLC, Intel, Seagate Technology, and more shared invaluable insight on “Solutions for an Application-driven World.” Industry specialists accentuated troublesome EUV stochastic resist effects and the importance of ArF immersion on-product overlay (OPO) control. Nikon technologists discussed the industry-leading NSR-S635E immersion scanner, which delivers unprecedented OPO and can be integrated with the revolutionary inline Alignment Station (iAS) module to improve alignment without impacting scanner productivity.

LithoVision presenters emphasized that i-line, KrF, ArF and immersion lithography play a substantial role in NAND, DRAM, and logic device processing, as well as in fields like hard disk drive production. Nikon previewed our deep product portfolio and shared exceptional overlay and productivity data for the S322F (ArF) and S220D (KrF) scanners, in addition to the SF155 i-line stepper. All of these systems are compatible with the LithoBooster Standalone Alignment Station.

This eReview features many LithoVision presentations, and spotlights Nikon initiatives focusing on customer support, internal training, and supporting next-generation and women in engineering programs, all vital to our continued success. We welcome your feedback on ways we can improve our products, programs, or services at npicom@nikon.com.

Featured Article

KLA-Tencor Research Scientist Emphasizes Stochastic Challenges at LithoVision 2018

Stochastic effects are an area of increasing focus and concern for EUV lithographers. John Biafore, Research Scientist at KLA-Tencor, provided an in-depth view of the many causes of these problematic effects as well as potential mitigation strategies at the Nikon symposium.

Innovations & Enhancements

Nikon Experts Introduce NSR-S635E and iAS/LithoBooster Innovations at LithoVision and SPIE

Nikon has been aggressively developing new technologies targeting scanner and process-related OPO error factors. Earlier this year, Nikon technologists introduced many innovations of the industry-leading NSR-S635E immersion scanner, and the iAS and LithoBooster alignment stations.

News

IC Knowledge President Shares View of Semiconductor Landscape at Nikon Symposium

IC Knowledge LLC President, Scotten Jones, updated LithoVision guests on the “Evolving Semiconductor Technology Landscape, and What it Means for Lithography,” and provided key insight on NAND, DRAM and logic device trends.

Intel Principal Engineer Highlights Overlay and Underlay Control Challenges in 193i Scaling

At the 15th annual Nikon conference, Dr. Martin Weiss, Principal Engineer with Intel’s Portland Technology Development group, highlighted the importance of overlay and underlay control in continuing 193i scaling.

Seagate Technology Expert Details HAMR Process and Hard Disk Drive Litho Requirements

At the recent LithoVision technical symposium Aaron Bowser, Senior Lithography Manager at Seagate Technology, shared valuable insights into the unique challenges and innovations in lithography for leading-edge hard disk drives.

Applied Materials Executive Stresses Criticality of Materials-Enabled Solutions for EPE

Dr. Uday Mitra, VP and CTO for the Etch Business Unit and Patterning Module at Applied Materials, discussed materials enabled solutions for EPE and logic scaling at the Nikon symposium.

The Latest Lithography Solutions for Advanced MEMS, LED, and Packaging Applications

As a superior alternative to mask aligners and outdated wafer steppers, Nikon continues to focus on expanding their specialized product portfolio to meet customers’ particular performance and budgetary objectives.

Events & Happenings

Nikon Precision Exhibiting at SEMICON West – July 10-12, 2018

Plan now to visit Nikon Precision at SEMICON West booth 505 in South Hall. We invite you to learn about our cutting-edge lithography products and programs.

Director of Nikon Research Corporation to Present at 25th Lithography Workshop – June 17-21, 2018

Dr. Stephen Renwick of Nikon Research Corporation of America will share insight on multiple patterning strategies at the upcoming session in Sun Valley, Idaho.

Nikon Corporation Recognized by Intel as a 2017 Achievement Award Winner for Technology

Nikon Implementing New Initiatives to Expand Customer Support Capabilities

To meet the dynamic requirements of our broad customer base, Nikon continuously innovates through optimizing internal training and operations, and by developing specialized customer support programs to satisfy individual fab objectives.

Nikon is Committed to Women in Engineering and Next-Generation Engineering Initiatives

Nikon continues to provide support for the enrichment and advancement of women engineers, and inspire the next generation of students by sponsoring several initiatives that promote careers in STEM.

LithoVision Achieves 15 Year Milestone Event

The 15th annual LithoVision symposium, which focused on “Solutions for an Application-driven World,” featured an excellent lineup of speakers and was lauded for having one of the best agendas ever among our technical programs.

Spring 2018 Edition

Featured
  • KLA-Tencor Research Scientist Emphasizes Stochastic Challenges at LithoVision 2018
Innovations & Enhancements
  • Nikon Experts Introduce NSR-S635E and iAS/LithoBooster Innovations at LithoVision and SPIE
News
  • IC Knowledge President Shares View of Semiconductor Landscape at Nikon Symposium
  • Intel Principal Engineer Highlights Overlay and Underlay Control Challenges in 193i Scaling
  • Seagate Technology Expert Details HAMR Process and Hard Disk Drive Litho Requirements
  • Applied Materials Executive Stresses Criticality of Materials-Enabled Solutions for EPE
  • The Latest Lithography Solutions for Advanced MEMS, LED, and Packaging Applications
Nikon Happenings
  • Nikon Precision Exhibiting at SEMICON West – July 10-12, 2018
  • Director of Nikon Research Corporation to Present at 25th Lithography Workshop – June 17-21, 2018
  • Nikon Corporation Recognized by Intel as a 2017 Achievement Award Winner for Technology
  • Nikon Implementing New Initiatives to Expand Customer Support Capabilities
  • Nikon is Committed to Women in Engineering and Next-Generation Engineering Initiatives
  • LithoVision Achieves 15 Year Milestone Event

© Copyright 2019 Nikon Precision Inc. · All Rights Reserved ·
Visit www.nikonprecision.com | Privacy Policy